Double-stage Reverse Osmosis EDI Ultrapure Water Equipment – ​​Meeting High-Standard Water Requirements

In EDI equipment, various ions in the feed water are removed after passing through the resin, purifying the water. This process utilizes the principle of ion exchange to remove ions from the water. Because a voltage is applied across the ion exchange membrane, water molecules are electrolyzed into H+ and OH- ions, which are then sent to regenerate the resin. Simultaneously, the ions exchanged by H+ and OH- ions are migrated to the concentrate chamber and discharged under the influence of a stable voltage and current power supply, thus achieving continuous regeneration and continuous use.

Product Advantages

1. Complete set configuration, integrated structure, small footprint, easy installation and use.

2. Advanced technology, reasonable design, continuous production of Pure Water without acid or alkali regeneration.

3. High equipment performance, simple maintenance, and low operating costs.

4. Fully automatic operation with safety protection devices such as water shortage protection and low-pressure protection.

5. Highly efficient water production, meeting water quality standards, effectively removing heavy metals, bacteria, suspended solids, etc., meeting the requirements for Drinking Water and various industrial pure water.

Applicable Industries

◆GMP Pharmaceutical Requirements: Water for in vitro diagnostic reagents, ultrapure water in laboratories, etc.

◆Battery Industry: Pure water for the production of storage batteries, lithium batteries, and solar cells.

◆Electroplating Industry: Water for gold plating, silver plating, chromium plating, plastic electroplating, electroless plating, zinc plating, etc.

◆Cosmetics Industry: Water for the production of skin care products, shampoos, hair dyes, toothpaste, hand sanitizers, etc.

◆Electronics Industry: Aluminum foil cleaning; electron tube coating solution preparation; cleaning, precipitation, wetting, film washing, and neck cleaning of picture tubes; LCD screen cleaning and solution preparation; water for cleaning and preparing silicon wafers for transistors and integrated circuits.

◆High-purity water for glass coating, water for cleaning glass products, water for cleaning lamps, etc.